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  Physics Express 2013, 3: 15
  Research Article
 
Structural and electrical characteristics of nanocrystalline copper nickel oxide films formed by RF magnetron sputtering
  A. Sreedhar, M. Hari Prasad Reddy, S. Uthanna  
     
Department of Physics, Sri Venkateswara University, Tirupati - 517 502, India
   
  Abstract  
  Copper-nickel-oxide (CuNiO2) thin films have been deposited on glass substrates by RF magnetron sputtering of an equimolar copper nickel alloy target (Cu50Ni50) at a fixed oxygen partial pressure of 2x10-2 Pa and at different substrate bias voltages in the range from 0 to -90 V. The X-ray diffraction studies revealed that single phase nanocrystalline CuNiO2 thin films were achieved at substrate bias voltage = -30 V. The crystallite size of the films increased from 2.2 to 2.5 nm with increase of substrate bias voltage from 0 to -60 V. The grain size of the films increased from 80 to 95 nm with increase of substrate bias voltage from 0 to -60 V. The films formed at substrate bias voltage of -60 V exhibited low electrical resistivity of 1.5 Ωcm, Hall mobility 19 cm2V-1sec-1 and hole concentration of 2x1017 cm-3.
     
  Keywords  
  RF magnetron sputtering; Thin films; Structure; Electrical properties  
     
   
   
   
   
     

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