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  Journal of Nanoscience Letters 2014, 4: 3
  Research Article
 
Enhancement of surface antireflection using monolayer dielectric nanoparticle coatings
  Hsueh-Heng Lin, Chao Kai Huang, Jheng-Yuan Chen, Kien Wen Sun  
     
Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan
   
  Abstract  
  Dielectric nanoparticles are considered as fast, low cost, and easy-to-use material for antireflection (AR) purposes. In this report, we studied numerically the AR performance of two types of dielectric nanoparticles, namely, silica and polystyrene (PS), deposited on commercially available textured crystalline Si (c-Si) wafer surface with a closed-packed monolayer (ML) distribution. Simulations were performed using rigorous coupled-wave analysis (RCWA). We found that the AR performance revealed by the simulation analysis and experiments was strongly enhanced from 300 nm to 1200 nm. The AR effect was even more pronounced in the near-infrared (NIR) region. Our results clearly demonstrated the advantages of combining monolayer dielectric nanoparticles with the textured c-Si substrate to improve the surface AR properties. To compare with calculations, we developed a technique to deposit close-packed silica nanoparticles on textured c-Si wafers. Both experimental and numerical results indicate that the fabricated AR nanostructures have great potential in improving the efficiency of optoelectronics, especially for solar cells.
     
  Keywords  
  Antireflection; Dielectric nanoparticles; Optoelectronics; Silica; Polystyrene  
     
   
   
   
   
     

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